利用Batch Implant机台离子注入dose梯度分布调控注入均匀性的技术分析

Analysis of Regulate Implant Uniformity by Improving the Dose Gradient Distribution of Batch Implant Tool

阐述发现batch implant机台所作业的wafer状况,在wafer面内存在规律性梯度差异的dose分布。基于wafer processing过程中的形变现象,通过fine tune beam line及优化diskangle条件,可以定量设计dose梯度分布情况。通过优化离子注入在wafer面内分布的dose对称性,可以有效改善离子注入均匀性。

This paper describes regular dose gradient distribution in plane of a wafer which was processed by batch implant tool.Base on the shape change in a processing wafer,if fine tune beam line and optimize the disk angle condition,will quantitative design the dose gradient distribution.What’s better,the implant uniformity may be enhanced with an appropriate dose symmetry.