ArF浸没式光刻胶用抗水涂层研究进展

Research and Development of Anti-water Coating in ArF Immersion Photoresist

氟化氩(ArF)浸没式光刻需在光刻胶表面形成抗水涂层,阻挡光刻胶和水之间组分交换。抗水涂层对光刻胶的分辨率、工艺窗口、低缺陷要求起着重要作用,平衡抗水涂层的疏水性和碱溶性是设计聚合物结构的重点和难点。分析了形成抗水涂层的方法和成膜机理,对比了不同方法的优缺点,根据聚合物所含官能团及其碱溶性,对抗水涂层聚合物进行了分类总结,重点阐述抗水涂层聚合物的结构和性能要求,尤其关注了聚合物侧链的位阻效应和氢键作用对涂层的疏水性影响。最后对抗水涂层的应用和发展进行了展望。

It was necessary to form anti-water coating on the surface of photoresist to prevent the interaction between photoresist and water in ArF immersion lithography.Antiwater coating played an important role in resolution,process window,and defect of photoresist.And balancing the hydrophobic and alkaline solubility of anti-water coating was the key and difficult point in the designing of polymer structure.In this review,the methods and mechanisms of anti-water coating formation were analyzed,the advantages and disadvantages between different methods were compared.And the anti-water coating polymers were categorized and summarized based on their functional groups and alkaline solubility.The structure and performance of anti-water coating polymers were focused,especially the effects of steric and hydrogen bonding on hydrophobicity of coating were highlighted.Finally,the application and development prospects were briefly discussed.