无掩模定域性电沉积微镍柱工艺研究

Study on Technology of Mask-Less Localized Electrodeposition of Micro-Nickel Column

无掩模定域性电沉积技术是一种以增材制造方式进行电化学沉积的先进制造方法。用定域性电沉积方法沉积微镍柱结构,通过实体显微镜和扫描电镜观察微镍柱沉积高度、直径及微观形貌,并根据测量结果计算平均沉积速率,设计双因素实验研究脉冲电压、电解液浓度、添加剂及电极间隙对定域性电沉积微镍柱的影响。结果表明:微镍柱平均直径及平均沉积速率随脉冲电压增大均快速增大,脉冲电压大于4.0V时微镍柱更为致密,但表面弯曲且粗细不均;不同脉冲电压下,改变电解液浓度产生的影响不同,主要影响微镍柱沉积速率及表面形貌;添加剂(PPS-OH)使微镍柱表面形貌变得光滑平整、光亮度增加,微镍柱平均直径及沉积速率随添加剂含量增大而减小;电极间隙主要影响微镍柱沉积形态及沉积速率,电极间隙大于10μm时沉积得到的微镍柱逐渐呈现圆锥状,平均沉积速率减小明显。当脉冲电压4.2V、氨基磺酸镍含量300g/L、添加剂(PPS-OH)含量0.5g/L及电极间隙10μm时,无掩模定域性电沉积得到的微镍柱形状规整、粗细均匀且表面光滑平整。

Mask-less localized electrodeposition technology is an advanced manufacturing method for electrochemical deposition in the way of additive manufacturing.The structure of micro-nickel column was deposited by localized electrodepositing.The depo-sition height、diameter and morphology of micro-nickel column were observed by microscope and scanning electron microscope.The average deposition rate was calculated based on measured results.A two-factor experiment was designed to investigate the ef-fects of pulse voltage、electrode gap、electrolyte concentration and additive concentration on micro-nickel column by localized elec-trodepositing.The results show that the average diameter and average deposition rate of micro-nickel column increased rapidly with the increase of pulse voltage.When pulse voltage was greater than 4.0V,the micro-nickel column became denser,but the sur-face was curved and uneven.The influence of changing electrolyte concentration is different at different pulse voltages,which mainly affects the deposition rate and surface morphology of micro-nickel column.Additive(PPS-OH)made the surface morphol-ogy of micro-nickel column smooth,and brightness increased.The average diameter of micro-nickel column decreases uniformly with the increase of additive concentration.The electrode gap mainly affects the deposition morphology and deposition rate of mi-cro-nickel column.When electrode gap is larger than 10µm,the micro-nickel column gradually became conical shape and the av-erage deposition rate obviously decreases.The micro-nickel column deposited by mask-less local electrodeposition has regular shape、uniform thickness and smooth surface when pulse voltage was 4.2V、the concentration of nickel sulfonate was 300g/L、the concentration of additive(PPS-OH)was 0.5g/L and electrode gap was 10µm.