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Optical colorimetric LiTaO_(3)wafers for highprecision lithography on frequency control of SAW devices

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摘要 Surface acoustic wave(SAW)resonators based on lithium tantalate(LT,LiTaO_(3))wafers are crucial elements of mobile communication filters.The use of intrinsic LT wafers typically brings about low fabrication accuracy of SAW resonators due to strong UV reflection in the lithography process.This hinders their resonance frequency control seriously in industrial manufacture.LT doping and chemical reduction could be applied to decrease the UV reflection of LT wafers for high lithographic precision.However,conventional methods fail to provide a fast and nondestructive approach to identify the UV performance of standard single-side polished LT wafers for highprecision frequency control.Here,we propose a convenient on-line sensing scheme based on the colorimetry of reduced Fe-doped LT wafers and build up an automatic testing system for industrial applications.The levels of Fe doping and chemical reduction are evaluated by the lightness and color difference of LT-based wafers.The correlation between the wafer visible colorimetry and UV reflection is established to refine the lithography process and specifically manipulate the frequency performance of SAW resonators.Our study provides a powerful tool for the fabrication control of SAW resonators and will inspire more applications on sophisticated devices of mobile communication.
出处 《Photonics Research》 SCIE EI CAS CSCD 2024年第2期341-349,共9页 光子学研究(英文版)
基金 Youth Talent Support Program of Fujian Province(Eyas Plan of Fujian Province) National Natural Science Foundation of China(62175205) Natural Science Foundation of Fujian Province(2020J06009)。
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