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DBD等离子体协同MnFe_(2)O_(4)降解氢氯噻嗪性能研究

Degradation of hydrochlorothiazide by dielectric barrier discharge plasma combined with MnFe_(2)O_(4)
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摘要 文章研究介质阻挡放电(dielectric barrier discharge,DBD)等离子体协同MnFe_(2)O_(4)对常用药物氢氯噻嗪(hydrochlorothiazide,HCTZ)在水中的降解性能。通过溶剂热法制备磁性锰铁氧体MnFe_(2)O_(4)作为非均相芬顿催化剂,采用X射线衍射(X-ray diffraction,XRD)、X射线光电子能谱(X-ray photoelectron spectroscopy,XPS)和扫描电子显微镜(scanning electron microscope,SEM)分析手段对其结构进行表征。利用HCTZ模拟目标废水,分别研究不同的HCTZ初始质量浓度、溶液初始pH值、电源输入功率和MnFe_(2)O_(4)投放剂量等因素对体系降解性能的影响,结果显示随着药物初始质量浓度的提高会使降解效率持续下降,不断提升放电功率将更利于HCTZ的降解,且碱性环境会对处理过程产生抑制效应。同时研究发现,DBD/MnFe_(2)O_(4)体系下的最佳MnFe_(2)O_(4)投放剂量是50 mg,并且经5次循环使用后,体系仍能在25 min内将99%的HCTZ去除,表现出良好的重复使用性能。 The degradation of the commonly used drug hydrochlorothiazide(HCTZ)in water was studied using dielectric barrier discharge(DBD)in collaboration with MnFe_(2)O_(4).Magnetic manganese ferrite MnFe_(2)O_(4)was prepared by solvothermal method as heterogeneous Fenton catalyst,and its structure was characterized using X-ray diffraction(XRD),X-ray photoelectron spectroscopy(XPS)and scanning electron microscope(SEM).The target wastewater was simulated using HCTZ,and the effects of different initial mass concentration of HCTZ,initial pH value of solution,input power of power supply and dosage of MnFe_(2)O_(4)on the degradation performance of the system were respectively studied.The results show that the degradation efficiency will continue to decline with the increase of initial concentration of the drug,and the continuous increase of discharge power will be more conducive to the degradation of HCTZ.And the alkaline environment will have an inhibiting effect on the treatment process.It is also found that the optimal MnFe_(2)O_(4)dosage under DBD/MnFe_(2)O_(4)system is 50 mg,and after five cycles of use,the system can still remove 99%of HCTZ within 25 min,showing good reuse performance.
作者 叶晓冬 胡淑恒 许子牧 兰彦 程诚 YE Xiaodong;HU Shuheng;XU Zimu;LAN Yan;CHENG Cheng(School of Resources and Environmental Engineering,Hefei University of Technology,Hefei 230009,China;Institute of Plasma Physics,Hefei Institutes of Physical Science,Chinese Academy of Sciences,Hefei 230031,China)
出处 《合肥工业大学学报(自然科学版)》 CAS 北大核心 2024年第4期447-451,463,共6页 Journal of Hefei University of Technology:Natural Science
基金 国家自然科学基金资助项目(51777206,51807046,51877208) 安徽省医学物理与技术重点实验室基金资助项目(LMPT2017Y7BP0U1581) 合肥工业大学博士点专项研究基金资助项目(JZ2017HGBZ0944)。
关键词 介质阻挡放电(DBD) MnFe_(2)O_(4) 氢氯噻嗪(HCTZ) 芬顿反应 高级氧化工艺 dielectric barrier discharge(DBD) MnFe_(2)O_(4) hydrochlorothiazide(HCTZ) Fenton reaction advanced oxidation process
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