取向硅钢细化磁畴技术研究进展

Research Progress on Domain Refining Technology of Grain Oriented Silicon Steel

细化磁畴技术是取向硅钢生产过程中重要的技术手段之一,可有效降低带材损耗。介绍了取向硅钢损耗的影响因素、细化磁畴降低铁损的原理,同时对两种类型细化磁畴技术的原理和研究现状进行了综述。非耐热型细化磁畴技术相对成熟稳定,已实现工业应用。耐热型细化磁畴技术目前被少数企业所垄断,国内仅宝钢掌握大功率激光刻痕细化磁畴技术,而其他耐热型细化磁畴技术更多处于实验室研发阶段,无法应用于工业生产。在能源结构调整、电工装备要求不断提升的背景下,对耐热型取向硅钢提出了更多的需求,未来耐热型细化磁畴技术将成为取向硅钢细化磁畴技术的一个重点研究方向。

Domain refining technology is one of the important techniques in the production of grain oriented silicon steel,which can effectively reduce the core losses.The factors affecting the core loss of grain oriented silicon steel and the mechanism of iron loss reduction caused by domain refining are introduced.And the research status and principle of two types domain refining technology were reviewed.Non-heat-resistant domain refining technology was relatively mature and stable,was applied widely in industrial production.The heat-resistant domain refining technology was currently monopolized by a few enterprises.In China,high-power laser scribing technology has been only successfully developed in Baosteel.While other heat-resistant domain refining technology was currently under development in the laboratory,which cannot be applied in industrial production.Under the background of optimizing energy structure and increasing requirements of electrical equipment,more requirements were put forward for heat-resistant grain oriented silicon steel.In the future,heat-resistant domain refining technology become a key research direction of domain refining technology for grain oriented silicon steel.