沉积参数对TiO_(2)纳米薄膜的显微结构和光学性能的影响

Effect of Deposition Parameters on Microstructure and Optical Properties of TiO_(2)Nanofilms

采用直流脉冲磁控溅射的方法,在有机玻璃上沉积了纳米TiO_(2)光学薄膜。研究了沉积功率、基片温度等参数对TiO_(2)薄膜结构及光学性能的影响。借助椭圆偏振光测试仪、X射线光电子能谱仪(XPS)、X射线衍射仪(XRD)、分光光度计、原子力显微镜(AFM)等表征手段分析了薄膜的光学特性、元素组成、结晶性能及显微结构。结果表明:随沉积功率的增加,薄膜氧含量降低,粒径减小,折射率递增,可见光波段的透过率和反射率递减;随基片温度上升,薄膜的沉积速率降低,这促进了薄膜粒子的聚集,在光学方面表现为随温度上升,折射率及可见光透过率同时增加;TiO_(2)薄膜的禁带宽度在3.12~3.16eV之间,随沉积功率增加和基片温度上升,其禁带宽度递减。

Nano-sized TiO_(2)optical films were deposited on PMMA by DC pulsed magnetron sputtering method.The effects of deposition power,substrate temperature on the structure and optical properties of TiO_(2)films were studied.The optical properties,elemental composition,crystallization properties and microstructure of the films were analyzed by means of elliptic polarization analyzer,X-ray photoelectron spectroscopy(XPS),X-ray diffraction(XRD),spectrophotometer and atomic force microscope(AFM).The results show that with the increase of deposition power,the oxygen content of the film decreases,the particle size of the film decreases,and the refractive index increases,while the transmittance and reflectivity of the visible light band decreases.The increasing substrate temperature reduces the deposition rate of the film and promotes the aggregation of the film particles.The refractive index and visible light transmittance both increase with the substrate temperature.The band gap of TiO_(2)film ranges between 3.12-3.16 eV and decreases with the increase of deposition power and substrate temperature.