期刊文献+

第三代半导体发展现状及未来展望

Development tstatussandfuture prospect of theewide band-gap semiconductors
原文传递
导出
摘要 在分析第三代半导体重要战略意义的基础上,讨论了中国在相关领域技术和产业化能力的发展状况,阐述了“大尺寸、降成本”是当前碳化硅及氮化镓技术的发展重心,并探讨了第三代半导体行业企业发展模式以及可能存在的问题及风险。尽管中国已具备良好基础,但仍存在不足,建议在国家政策的指导下,以应用牵引实现发展,加大产线的持续支持力度,系统地丰富产品形态,促进第三代半导体产业高质量发展,把握未来应用新机遇。 In recent years,the wide band-gap semiconductors endowed with superior performance,particularly the SiC and GaN,have developed rapidly.As the research focuses in the fields of 5G communications,new energy vehicles,rail transit,military equipment,etc,these semiconductors have supported the development of a trillion-level market,and the new application scenarios are constantly emerging to stimulate new development potential.China has established a relatively complete industrial chain,i.e.,from the substrate,epitaxy,design,manufacturing,module,testing to the final application.At the same time,the technology and industrialization ability as well as the independent controllable ability continues to be enhanced.Some of the achievements have been applied,and now the"large size and cost reduction"turns to be the main direction of future development.At present,China as the largest application market has launched the strong driving force of application traction for technology innovation.However,the wide band-gap semiconductor industry also faces many challenges,e.g.,the industrial ecological development issues.It is an urgent need to take fully advantages of the"two-wheel drive"of application and research and development to realize the rapid transformation of scientific and technological achievements.It is suggested that the continuous support should be enhanced,under the guidance of policies and the traction of new application scenarios,to systematically enrich the product form and to promote the high-quality development of the whole industrial chain for seizing new opportunities of future applications.
作者 高爽 郑宇亭 张志国 GAO Shuang;ZHENG Yuting;ZHANG Zhiguo(China Electronics Technology Wide BandGap Semiconductors Co.,Ltd.,Beijing 100041,China)
出处 《科技导报》 CAS CSCD 北大核心 2024年第8期29-38,共10页 Science & Technology Review
关键词 第三代半导体 碳化硅 氮化镓 5G通讯 企业模式 swide band-gap semiconductors SiC GaN 5G communication enterprise model
  • 相关文献

参考文献7

二级参考文献28

  • 1TetsuzoUeda, SatonlTakahashi, HiroyukiUmimoto. Next-generation Power Switching Devices for Automotive Applications: GaN and SiC [J] . Panasonic Technical Journal, 2015 (1) : 32-37.
  • 2Kimimori Hamada, Member, IEEE, Masaru Nagao, Masaki Ajioka, and Fumiaki Kawai.SiC--Emerging Pow- er Device Technology forNext-Generation Electrically Powered Environmentally Friendly Vehicles [J] . IEEE Transactions on Electron Devices, Vol. 62, No. 2, Febnmry 2015.
  • 3John Roberts-GaN Systems Inc. , CANADA. Lateral GaN Transistors -A Replacement for IGBT devicesin Au- tomotiveApplications [C] . PCIM Europe 2014, 20 22 May 2014, Nuremberg, Germany.
  • 4Y-F Wu and K. Smith.Progress of GaN Transistors for Automotive Applications [C]. PCIM Europe 2015, 19-21 May2015, Nuremberg, Germany.
  • 5Girvan Patterson, GaN Systems Inc, Ottava, Canada. Automotive Opportunities for Power GaN [J] . Power Electronics Europe. Issue 4 2015.
  • 6蔡蔚.新能源汽车产业的机遇和挑战[N].学习时报.2015-11-19.
  • 7Ming Su and Chingchi Chen. Can SiC or GaN power the next-generation hybrid electric vehicle drive systems [C] . CS international conference, March 18th, 2014, Frankfurt, Germany.
  • 8杨莺,林涛,陈治明.Effect of Growth Gas Flow Rate on the Defects Density of SiC Single Crystal[J].Journal of Semiconductors,2008,29(5):851-854. 被引量:1
  • 9苗瑞霞,张玉明,汤晓燕,张义门.SiC晶体缺陷的阴极荧光无损表征研究[J].光谱学与光谱分析,2010,30(3):702-705. 被引量:1
  • 10熊礼威,汪建华,满卫东,刘长林,翁俊.金刚石半导体研究进展[J].材料导报,2010,24(7):117-121. 被引量:8

共引文献92

相关作者

内容加载中请稍等...

相关机构

内容加载中请稍等...

相关主题

内容加载中请稍等...

浏览历史

内容加载中请稍等...
;
使用帮助 返回顶部