基于高频率公转速度变化策略的极紫外多层膜均匀性研究

Homogeneity Study of Extreme Ultraviolet Multilayer Films Base on High Frequency Revolution Speed Variation Strategy

应用自研高真空磁控溅射镀膜系统,在高反射率和高均匀性极紫外Mo/Si多层膜方面开展实验研究。采用高速匀速自转和调节公转转速相结合的行星运行式镀膜方法,在高频率公转速度变化策略下,实现了多层膜周期厚度的较高均匀性。实验结果表明,通过公转速度高频变化,连续调整基底掠过靶材表面的速度,提高了多层膜周期厚度的均匀性,在150 mm直径范围内,曲面基底上6.92 nm周期厚度的Mo/Si多层膜周期厚度的相对偏差优于±0.3%。同步辐射测试结果表明,在入射角5°时,Mo/Si多层膜在中心波长13.5 nm处反射率达62.2%。

A self-developed high-vacuum magnetron sputtering coating system is applied to carry out experiments in the direction of preparing high reflectivity and high uniformity extreme ultraviolet Mo/Si multilayers.The planetary running coating method combining high speed uniform spinning and adjusting the rotational speed of the rotor is used to realize the high uniformity of the multilayer film cycle thickness under the strategy of high variable speed of the rotor.The experimental results show that the uniformity of the multilayer film cycle thickness is improved by continuously adjusting the speed of the substrate swept over the target surface through the high-speed variation of the rotational speed,and the relative deviation of the Mo/Si multilayer film cycle thickness of 6.92 nm cycle thickness on the curved substrate is better than±0.3%in the 150 mm diameter range.Synchrotron radiation test results show that at an incidence angle of 5°,the reflectivity of the Mo/Si multilayer film is 62.2%at the center wavelength of 13.5 nm.