浅谈光刻胶生产工艺

Brief Introduction of Photoresist Production Process

光刻胶是微电子技术中微细图形加工的关键材料之一,光刻胶长年被国外专业公司垄断,目前我国微电子材料对国外依赖较高,所以半导体材料国产化代替是必然趋势。光刻胶属于特别复杂的材料化学,它的质量直接决定芯片的良率;在此,通过光刻胶树脂、光敏剂、光刻胶稀释剂、光致产酸剂等相关原辅料的制备,引导企业研发、生产光刻胶,早日实现国产化。

Photoresistwasone of the key materials for micro-pattern processing in microelectronic technology.Photoresist had been monopolized by foreign professional companies for many years,so it was inevitable that List of semiconductor materials would be replaced by domestic production.Photoresist was a particularly complex material chemistry,its quality directly determined the chip yield;here,through photoresistresin,photosensitizer,photoresistdiluent,photoacidogenic agent and other related raw materials and accessories preparation,guide Enterprises to research and development,production of photoresist,the early realization of localization.