摘要
为优化SUVA3工艺中左右视角色偏(CR_((80/20)))较UV^(2)A工艺差的问题,从工艺、设计等方向,进行了组合曝光(PBS+WGP模式)、ITO狭缝角度、偏光片角度(WGP)等条件的探究。结果表明:组合曝光(PBS+WGP模式)、ITO角度、WGP角度均可优化色偏,但从色偏收益和量产性角度考虑,ITO Slit角度+WGP角度调整更优,其最优条件为:WGP角度为f°(极限角度)+ITO狭缝角度为I°,可将SUVA3工艺色偏优化至UV^(2)A工艺水准,CR_((80/20))可达到35.6%。
In order to improve the color deviation of the SUVA3,by which the left and right visual role bias(CR_((80/20)))was worse than that of UV^(2)A process,the combined energy exposure(PBS+WGP mode),ITO Slit angle and WGP angle were studied from the process,design and other aspects.The experimental results showed that the ITO slit+WGP mode had better effect,as far as the color deviation&mass production were concerned,and the color deviation of SUVA3 could be optimized to the level of UV^(2)A.
作者
张勇
李林
任驹
李凡
彭林
吴潘强
ZHANG Yong;LI Lin;REN Ju;LI Fan;PENG Lin;WU Panqiang(Chengdu BOE Display Sci-tech Co.,Ltd.,Chengdu 610299,CHN)
出处
《光电子技术》
CAS
2024年第2期168-172,共5页
Optoelectronic Technology