摘要
对GH2132合金进行900℃和650℃的氧化试验,利用XRD分析了氧化膜的主要产物,利用扫描电镜观察氧化膜的表面及截面形貌,结合EDS能谱数据,研究了GH2132合金的氧化机理。结果表明,在900℃下,GH2132合金氧化膜主要由Cr_(2)O_(3)+Fe_(2)O_(3)组成,抗氧化性能在100~200 h由抗氧化性转变为完全抗氧化性,随着氧化保温时间的延长,发生内氧化,生成的氧化膜会产生剥落,到500 h,内氧化深度达到110.34μm;在650℃下,GH2132合金表层氧化膜主要由Fe_(2)O_(3)、少量的Fe+2Cr2O4及Fe0.64Ni0.36组成,始终为完全抗氧化性,氧化膜紧实,没有内氧化现象,到1600 h,氧化膜厚度为15.17μm,合金在650℃下可长期使用。
Oxidation test of GH2132 alloy was carried out at 900℃and 650℃,the main products of the oxide film were analysed by XRD,the surface and cross⁃section morphologies of the oxide film were observed by scanning electron microscope,and the oxidation mechanism of the GH2132 alloy was investigated combining with the data of EDS energy spectra.The results show that at 900℃,the oxide film of the GH2132 alloy is mainly composed of Cr_(2)O_(3)+Fe_(2)O_(3),and the antioxidant property changes from antioxidant properties to complete antioxidant properties in 100⁃200 h.With the extension of the oxidation holding time,internal oxidation phenomenon occurs and the generated oxide film flakes off,and the depth of internal oxidation reaches 110.34μm by 500 h.At 650℃,the GH2132 alloy surface oxide film mainly consists of Fe_(2)O_(3)and small amounts of Fe+2Cr2O4 and Fe0.64Ni0.36,which is always completely antioxidant properties with compact oxide film,and there is no internal oxidation phenomenon.When up to 1600 h,the thickness of the oxide film is 15.17μm,indicating that the alloy can be used for a long time at 650℃.
作者
徐超凡
陈佳俊
王守乾
赵守忠
沈佳宝
闵亮
Xu Chaofan;Chen Jiajun;Wang Shouqian;Zhao Shouzhong;Shen Jiabao;Min Liang(School of Materials Science and Engineering,Jiangsu University of Science and Technology,Zhenjiang Jiangsu 212100,China)
出处
《金属热处理》
CAS
CSCD
北大核心
2024年第6期49-54,共6页
Heat Treatment of Metals