高功率脉冲磁控溅射技术制备ta-C膜及性能改性研究

Preparation of ta-C Film by High-Power Impulse Magnetron Sputtering Technology and Its Performance Modification

硬质合金表面沉积四面体非晶碳膜(ta-C薄膜)的结合力和摩擦性能影响着其在切削刀具和耐磨零部件领域的应用效果。基于高功率脉冲磁控溅射技术(HiPIMS)制备了ta-C薄膜,通过调节C2H2流量对ta-C薄膜进行了改性研究。利用SEM对薄膜厚度进行观察,通过拉曼和XPS对其结构进行研究,通过纳米压痕对其硬度进行表征,通过纳米划痕对薄膜的结合力进行研究并通过摩擦磨损试验对薄膜的耐磨性进行探究。结果表明,通入C2H2气体可有效改善ta-C薄膜的结构、硬度、结合力和耐磨性能。改变C2H2流量可调控ta-C薄膜的性能,随着C2H2流量的逐渐增大,薄膜的各项性能呈现先增大后减小的趋势,当C2H2流量为15 cm^(3)/min时,薄膜的各项性能都达到较为优异的结果,ta-C薄膜厚度达655.9 nm,硬度提高到43.633 GPa,结合力提升到19.2 N,此时sp3键含量为70.19%,ta-C薄膜表面均匀、致密,且性能优良。

The adhesion and friction performance of tetrahedral amorphous carbon film(ta-C film)deposited on the surface of hard alloy affect its application effect in cutting tools and wear-resistant components.In this work,ta-C thin film was prepared based on high power pulse mag-netron sputtering technology(HiPIMS),and the modification of ta-C thin film was studied through adjusting C2H2 flow rate.The thickness of the film was observed by SEM,the structure of the film was studied through Raman and XPS,the hardness of the film was characterized through nanoindentation,the adhesion of the film was analyzed by nanoscratches,and the wear resistance of the film was tested through friction and wear tests.Results showed that the introduction of C2H2 gas could effectively improve the structure,hardness,adhesion and wear resistance of ta-C film.Changing the C2H2 flow rate could regulate the performance of ta-C film.As the C2H2 flow rate gradually increased,the various properties of the film showed a trend of first increasing and then decreasing.When the flow rate of C2H2 was 15 cm^(3)/min,the various properties of the film reached excellent results.Specifically,the as-obtained ta-C film had the thickness of 655.9 nm,the hardness of 43.633 GPa and the adhesion force of 19.2 N.Besides,the content of sp3 bond was 70.19%,and the surface of ta-C film was uniform and dense with good performance.