涂胶显影设备的静电防护设计

Design of electrostatic protection for adhesive development equipment

文章以静电的危害及产生机理为引申,分析了半导体涂胶显影设备如何在设计细节、制造调试环节去实现静电释放,避免静电的影响。首先,通过静电消除器和STHC的应用阐述了涂胶显影设备的微环境控制静电的设计方案。然后,从涂胶显影设备使用的液体DIW、有机溶剂的传输方案介绍了EFLOW、防静电管的使用背景,并重点说明NTD单元的静电接地方式。最后,针对spin单元零件设计的材料选择及制造工艺做了分析。

The article takes the harm and generation mechanism of static electricity as an extension to analyze how semiconductor coating and developing equipment can achieve static discharge in design details,manufacturing and debugging stages,and avoid the impact of static electricity.Firstly,the design scheme for controlling static electricity in the microenvironment of adhesive development equipment was elaborated through the application of electrostatic eliminators and STHC.Then,the background of the use of EFLOW and anti-static tubes was introduced from the liquid DIW used in the adhesive development equipment and the transmission scheme of organic solvents,with a focus on the electrostatic grounding method of the NTD unit.Finally,an analysis was conducted on the material selection and manufacturing process for the design of spin unit components.