摘要
采用电子束蒸发法和光刻技术在5×5 mm^(2)的Si衬底上制备了长度为5 mm、条带间距固定为30μm、条带宽度为20~140μm的Ni_(80)Fe_(20)软磁薄膜,分析了条带宽度对薄膜静态及动态磁性能的影响。结果表明,薄膜的面内矫顽力和各向异性场随着条带宽度的增大而减小,各向异性场从235 Oe减小到131 Oe。薄膜的共振频率f_(r)从连续薄膜的0.75 GHz增高到条带宽度为20μm时的2.81 GHz,起始磁导率大于350,制备了兼具较高磁导率和高共振频率的NiFe薄膜。
Ni_(80)Fe_(20) soft magnetic thin films with length of 5 mm,strip spacing of 30 μm and strip width of 20~140 μm were prepared on 5×5 mm^(2) Si-substrate by electron beam evaporation and lithography.The effect of strip width on the static and dynamic magnetic properties of Ni_(80)Fe_(20) thin films was studied.The results show that the in-plane coercivity and anisotropy field of the films decrease with the increase of the strip width,and the anisotropy field decreases from 235 Oe to 131 Oe.The resonance frequency f_(r) of the film increases from 0.75 GHz of the continuous film to 2.81 GHz when the strip width is 20 μm,and the initial permeability is more than 350.NiFe films with high permeability and high resonance frequency were prepared.
作者
吴昌金
邬传健
何宗胜
蒋晓娜
李启帆
余忠
兰中文
孙科
WU Chang-jin;WU Chuan-jian;HE Zong-sheng;JIANG Xiao-na;LI Qi-fan;YU Zhong;LAN Zhong-wen;SUN Ke(School of Materials and Energy,University of Electronic Scienceand Technology of China,Chengdu 610054,China)
出处
《磁性材料及器件》
CAS
2024年第4期19-23,共5页
Journal of Magnetic Materials and Devices
基金
国家自然科学基金项目(52172267)。
关键词
NiFe薄膜
电子束蒸发
图案化
磁性能
NiFe film
electron beam evaporation
patterning
magnetic properties