基底温度对磁控溅射制备NiO_(x)薄膜综合电致变色性能的影响

Effect of Substrate Temperature on Comprehensive Electrochromic Properties of Magnetron Sputtered NiO_(x) Films

为研究基底温度对NiO_(x)薄膜综合电致变色性能的影响,在基底温度分别为室温、50、100、200和300℃下,采用直流反应磁控溅射法制备了NiO_(x)薄膜,并对薄膜的形貌、循环稳定性、光学调制率、记忆效应、响应时间和附着力等性能进行测试表征和对比分析。研究结果表明,基底温度对NiO_(x)薄膜的电致变色性能影响较为复杂,基底温度为100℃时制备的薄膜综合性能最优,具有电荷容量密度衰减率低、记忆效应好、响应速度快、调制率高和与基底附着力较好等特点。本研究对NiO_(x)基电致变色器件的设计和制备具有一定的参考意义。

In order to study the effect of the substrate temperature on the electrochromic properties of NiO_(x) film,DC reaction magnetron sputtering method was used to prepare NiO_(x) film at different substrate temperatures,i.e,room temperature,50,100,200 and 300 ℃.The properties of the films including structure and morphology,cyclic stability,optical modulation rate,memory effect,response time,and adhesion to the substrate were explored and compared.The results show that the effect of the substrate temperature on the electrochromic properties of NiO_(x) film is complicated.NiO_(x) film prepared at 100 ℃ shows low charge capacity density decay rate,good memory effect,fast response speed,high modulation rate and good adhesion to the substrate.This study may have certain reference significance for the design and fabrication of NiO_x-based electrochromic devices.