后发企业与创新联合体共演驱动产业关键核心技术持续突破的机制研究

Mechanism study on the co-evolution of latecomer-led innovation consortia driving continuous breakthrough of key core technology

如何持续突破产业关键核心技术,是以科技创新引领现代化产业体系构建、加快发展新质生产力的核心抓手与重点议题。然而现有研究鲜有关注中观层面如何桥接宏观产业生态和微观主体,进而实现产业关键核心技术持续突破的过程机制这一重要的理论与实践议题。本研究聚焦光刻机这一集成电路产业代表性关键核心技术,以光刻系统集成商ASML为案例,运用纵向单案例方法系统探究:后发企业如何通过与创新联合体共演,持续突破产业关键核心技术并实现超越追赶?研究发现:面向光刻技术的阶跃性目标,基于“动机(M)-战略(S)-创新联合体(C)”的过程逻辑,ASML与其创新联合体持续共演,通过“权力分配”主体协同、“产业牵引”知识整合和“核心-外围”利益共生三种价值共创机制,驱动光刻机技术持续突破。随着创新联合体从萌芽、升级、强化到共生,ASML逐步完成其在光刻市场的后发追赶到引领超越。研究结论拓展并深化了产业创新生态系统视角下产业关键核心技术突破与后发追赶的理论研究,为培育壮大科技领军企业,提升产业技术创新能力,加快现代化产业体系建设和发展新质生产力提供重要启示。

Continuous breakthroughs of industrial key core technologies are the key for promoting innovation to lead the construction of modernized industrial system,promoting new-quality productivity.However,few studies have paid attention to the important theoretical and practical issue of how meso-organizations bridge the macro-ecology and micro-agent to promote the process mechanism of continuous breakthroughs in industrial key core technologies.This study focused on photolithography,a representative key core technology of the IC industry,and took ASML as the research object,by using the case study method to systematically explore:how latecomers can continuously make breakthroughs in industrial key core technologies and go beyond catch-up through co-evolution with innovation consortium.We found that:facing the stepwise goal of lithography technology,based on the process logic of"Motivation(M)-Strategy(S)-Innovation Consortium(C)",ASML and its innovation consortium continue to co-evolve,which drives the continuous breakthrough of lithography technology through the three value co-creative mechanisms.This process consists of the synergy of the main body of"distribution of power",integration of knowledge in"industrial traction",and"core periphery"interest co-generation.During this process,the innovation consortium evolves from the embryonic,upgrading,consolidation stages to the symbiosis stage,while ASML has gradually accomplished the catching-up to the leading position in the lithography market.This research will deepen the theoretical research on the breakthroughs and catch-up in industrial key core technologies from the perspective of industrial innovation ecology,and provide important inspirations for promoting industrial technological innovation system and capability,and accelerating the development of new-quality productivity.