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基于染色示踪法的平面口罩泄漏点检测

Detection of mask leakage point based on dyeing tracer ethod
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摘要 针对目前平面口罩密合性检测只能评价其泄漏程度,无法准确标记口罩泄漏点的问题,设计了一种基于染色示踪法的口罩泄漏点检测装置,使用染色示踪剂在口罩内部产生可视化标记,通过单因素变量法探究头模尺寸、颗粒物直径、染料配比、呼吸频率、呼吸流量等因素对检测结果的影响,得出结论:头模尺寸为中号,颗粒物直径为0.15μm,染料体积配比(染料∶水)为6∶4,呼吸频率为20次/min,呼吸流量为550 mL/次,仓内颗粒物质量浓度约为0.3~0.5 mg/m^(3)时,口罩泄漏点位置较为明显;超细颗粒物泄漏区域主要集中在鼻梁、脸颊、颧骨以及下巴等处;基于染色示踪法的口罩泄漏点检测可以更为直观、准确地标记出口罩泄漏点位置,为企业对口罩进行优化设计提供参考依据,具有一定的应用推广价值。 In view of the problem that the current tightness detection of flat masks can only evaluate the leak degree and cannot accurately mark the leak point of masks,a mask leak point detection device based on the dyeing tracer method was designed.The dyeing tracer was used to generate visual marks inside the mask.The influence of the head mold size,particle diameter,dye ratio,respiratory rate,respiratory flow rate and other factors on the accuracy of the detection results were explored by single factor variable method.The conclusion was drawn that when the head mold size is medium,the particle diameter is 0.15μm,the dye volume ratio(dye∶water)is 6∶4,the respiratory rate is 20 times/min,the respiratory flow rate is 550 mL/time,and the particle mass concentration in the bin is about 0.3~0.5 mg/m^(3),the leakage point of the mask is more obvious.The leakage area of ultrafine particles mainly concentrated in the bridge of nose,cheek,cheekbone and chin.The mask leak detection technology based on dyeing tracer method can mark the mask leak location more intuitively and accurately,and provide a reference for enterprises to optimize the design of masks,and has certain application and promotion value.
作者 琚钦涵 杨森 孙启龙 龙啸云 JU Qinhan;YANG Sen;SUN Qilong;LONG Xiaoyun(National and Local Joint Engineering Research Center for Research and Development of Special Fiber Composite Materials for Safety Protection,Nantong University,Nantong,Jiangsu 226019,China;Jiangsu Special Safety Protection Product Quality Supervision and Inspection Center,Taizhou,Jiangsu 225300,China)
出处 《毛纺科技》 CAS 北大核心 2024年第8期124-130,共7页 Wool Textile Journal
基金 国家重点研发计划项目(2020YFF0217903)。
关键词 平面口罩 密合性 染料示踪 泄漏点 mask tightness dye tracing leakage point
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