一种应用在半导体行业的评价尾气移除效率的测试方法

A Test Method to Evaluate Destructive Removal Efficiency(DRE)Used in Semiconductor Industry

在半导体行业,选择使用尾气处理设备对CF4、NF3和NH3等半导体工艺制程气体进行燃烧水洗等环保处理。尾气的分解移除效率(DRE)是评价尾气处理性能的关键指标。首次建立了一种测试和计算DRE的检测方法:使用一台傅里叶变换红外光谱仪(FTIR),采用六氟化硫作为示踪气体,分别测试尾气处理设备的进口总流量、出口总流量、进口的尾气浓度以及出口的尾气浓度,根据公式计算得到尾气的分解移除效率,以实时监控和评价尾气处理设备的性能。这对于尾气处理设备行业的测试的标准化意义重大。

In semiconductor industry,the tail gas treatment equipment was used to do environmental protection treatment for semiconductor process gas like CF4,NF3 and NH3 including combustion and washing.The destructive removal efficiency(DRE)was a key parameter to evaluate the performance of tail gas treatment.A test method was specified to measure and calculate the destructive removal efficiency(DRE),and we based on FTIR as measurement tool and used SF6 as tracer gas to measure the total flow of inlet port flow,total flow of outlet port,process gas concentration of inlet port and process gas of outlet port of the tail gas treatment equipment.And then DRE could be calculated based on formular to monitor the performance of the tail gas treatment equipment,which was significant for test standardization of the tail gas treatment equipment.