专利公开充分对科技创新的影响——基于专利公开程度与保护强度的均衡分析

The Impact of Patent Disclosure on Technological Innovation-Balanced Analysis Based on Patent Disclosure Degree and Protection

公开充分在各国的专利法中均是授予专利权的必要条件之一,是专利制度“以公开换取保护”原则的集中体现,其经济学实质是拒绝保护没有技术成本的技术垄断。公开充分中专利公开程度的具体要求是为了满足所属技术领域科技创新的需求,这与专利对技术创新的保护强度有着密切关系。本文分析专利公开程度和专利保护强度对私人和社会公众的影响情况,并进一步构建专利公开程度与专利保护强度的“二维四象限”模型,研究专利政策环境对科技创新的影响,并以美国专利制度变迁为例验证模型的结论,为进一步完善我国专利制度提供启示。当前,我国正处于迈向创新型国家前列的关键时期,知识产权强保护格局已经初见成效,确保专利公开所贡献的技术内容与专利垄断所获得范围相适应,这既是对技术垄断者的合理要求,也为我国自主创新赢得时间和空间,实现高水平科技自立自强。

Sufficient disclosure is one of the requirements for grant of patent right in patent law of various countries,which is the concentrated embodiment of the principle of“disclosure in exchange for protection”of patent system.Its economic essence is to refuse to protect the technology monopoly without technical costs.The specific requirement for the degree of patent disclosure is to meet the needs of technological innovation in the corresponding technical field,which is closely related to patent protection intensity.This paper analyzes the impact of patent disclosure degree and patent protection intensity on private and public respectively,and further constructs the“two-dimensional four quadrant”model of patent disclosure degree and patent protection intensity to study the impact of patent policy environment on scientific and technological innovation,providing a basis for the model by taking the changes in the US patent system,aslo providing inspiration for improving China’s patent system.Currently,China is in the key period of moving to the forefront of innovative countries,and the pattern of strong protection of intellectual property has achieved initial results.Ensuring that the technical content contributed by patent disclosure is compatible with the scope of patent monopoly,is not only a reasonable requirement for the technology monopolist,but also helpful for China to seizes the opportunity helpful for independent innovation,and achieve high-level sci-tech self-reliance and self-strengthening.