基于接近接触式曝光机的暗场对准技术

Dark Field Alignment Technology Based on Mask-Aligner

为了解决接近接触式曝光机实际生产过程中标记范围较小的问题,设计一种气缸控制结构。配合显微镜的升降和显微镜的光路,形成一套适用于接近接触式曝光机的暗场对准的软硬件技术,实现了暗场掩膜对准的成本降低,提升了接近接触式曝光机的对准效率和稳定性提升。

In order to solve the problem of Mask-Aligner markers in the process of actual production,design a cylinder control structure.With the microscope lifting and microscope light path,form a set of suitable for Mask-Aligner of Dark Field Alignment Technology with hardware and software technology,realize the dark field mask alignment cost reduction,improve the efficiency of close contact exposure machine alignment and stability.