电感耦合等离子体质谱法(ICP-MS)测定光刻胶中痕量元素

Determination of Trace Elements in Photoresist by Inductively Coupled Plasma Mass Spectrometry(ICP-MS)

利用电感耦合等离子体质谱仪,建立了一套完整检测光刻胶中Li、Na、Mg、Al、K、Ca、Cr、Mn、Fe、Co、Ni、Zn、Ga、Pd、Ag、Sn、W、Pb、Bi等19种痕量元素的方法。通过仪器调谐,优化电感耦合等离子体质谱仪的工作参数,采用标准加入法校正基体,考察了该检测方法的检出限、精密度及加标回收率。结果表明,各元素的检出限在0.04~1.46ng·L^(-1)之间,加标回收率在90.0%~109.10%之间,精密度均小于3%。该方法简单易操作,精密度高,准确性好,可满足实际生产中对光刻胶的检测需求。

A complete detection method for trace elements of Li,Na,Mg,Al,K,Ca,Cr,Mn,Fe,Co,Ni,Zn,Ga,Pd,Ag,Sn,W,Pb,Bi in photoresist was established by inductively coupled plasma mass spectrometry.The detection limit,precision,and spiked recovery rate of the detection method were investigated under the condition of tuning and optimizing the working parameters of the inductively coupled plasma mass spectrometer,and standard addition method was used for matrix calibration.The results showed that the detection limits of these element were within the range of 0.04~1.46 ng/L,the spiked recovery rates were within the range of 90.0%~109.1%,and the precisions were less than 3%for all the elements.This method was simple,easy to operate,and had high precision and good accuracy,that could meet the detection demand of photoresist in actual production.