浅谈电子级氢氟酸的除砷工艺

Discussion on the Arsenic Removal Process of Electronic Grade Hydrofluoric Acid

电子级氢氟酸是在半导体制造等高纯度工艺中常用的酸性溶液,但其中可能含有砷等杂质,需要进行除砷处理。对电子级氢氟酸的除砷工艺进行浅谈,涵盖了氧化法、离子交换法和电解法等多种常见方法,并简述了各个方法的优缺点。通过了解这些工艺方法,可以更好地理解电子级氢氟酸的除砷过程以及相关的技术挑战和解决方案。

Electronic grade hydrofluoric acid is a commonly used acidic solution in high-purity processes such as semiconductor manufacturing,but it may contain impurities such as arsenic,requiring arsenic removal treatment.This article will briefly discuss the arsenic removal process of electronic grade hydrofluoric acid,covering various common methods such as oxidation,ion exchange,and electrolysis,and briefly describe the advantages and disadvantages of each method.By understanding these process methods,readers can better understand the arsenic removal process of electronic grade hydrofluoric acid,as well as the related technical challenges and solutions.