摘要
Notably,the cleavage of Sn–C bonds in extreme-ultraviolet photoresists containing Sn-oxygen(oxo)clusters and the generation of free radicals upon exposure lead to the chemical linking of Sn-oxo cores and subsequent solubility shifts.The reactivities and migration patterns of the generated radicals substantially influence patterning outcomes,including sensitivity and resolution.Herein,two Snoxo clusters,Sn_(4)-Me-C_(10)(with Sn–methyl)and Sn_(4)-Bu-C_(10)(with Sn–butyl),were combined to balance the sensitivity and resolution of photoresists,leveraging the feedback regulation between methyl and butyl free radicals generated from Sn–C bond cleavage.During electron beam lithography exposure,sensitive butyl radicals produced by Sn_(4)-Bu-C_(10)initiated reactions within Sn_(4)-Me-C_(10),improving sensitivity.Subsequently,the unstable methyl and bulky adamantyl radicals generated by Sn_(4)-Me-C_(10)quenched the excess butyl radicals,thus improving the resolution and exposure latitude.Thus,this method leveraging the feedback regulation of free radicals offers new insights into the design of sensitive metal oxide resists with enhanced resolution.
锡氧团簇极紫外光刻胶中的Sn–C键在曝光时发生裂解并产生自由基,导致锡氧核的连接和溶解度变化.Sn–C键的反应活性和所产生自由基在薄膜中的迁移会对图案化结果(灵敏度和分辨率)产生重大影响.在此,我们将Sn_(4)-Me-C_(10)(含Sn–methyl键)和Sn_(4)-Bu-C_(10)(含Sn–butyl)这两种锡氧团簇结合起来,利用Sn–C键裂解产生的甲基和丁基自由基之间的反馈调节来平衡光刻胶的灵敏度和分辨率.Sn_(4)-Bu-C_(10)在低EBL曝光剂量下产生的丁基自由基引发Sn_(4)-Me-C_(10)的光刻反应,从而提高了灵敏度;随后,Sn_(4)-Me-C_(10)产生的不稳定甲基自由基和体积较大的金刚烷自由基淬灭过量的丁基自由基,从而提高了分辨率和曝光裕度.这种利用自由基反馈调节的方法为设计具有高分辨率、高灵敏度的锡氧团簇EBL光刻胶提供了新的思路.
作者
Hao Chen
Xinyan Huang
Yingdong Zhao
Jun Zhao
Pengzhong Chen
Xiaojun Peng
陈昊;黄心彦;赵英东;赵俊;陈鹏忠;彭孝军(State Key Laboratory of Fine Chemicals,Frontiers Science Center for Smart Materials,School of Chemical Engineering,Dalian University of Technology,Dalian 116024,China;Shanghai Advanced Research Institute,Chinese Academy of Sciences,Shanghai 201203,China;State Key Laboratory of Fine Chemicals,College of Materials Science and Engineering,Shenzhen University,Shenzhen 518060,China)
基金
financially supported by the National Natural Science Foundation of China(22090011 and 22378052)
the Fundamental Research Funds for China Central Universities(DUT22LAB608)
the Key R&D Program of Shandong Province(2021CXGC010308).
