Synthesis of double-helical snip nanowires for visible-light-driven photocatalytic degradation of dyes

双螺旋结构SnIP纳米线的合成及其可见光催化染料降解

As the first carbon-free double helical semiconductor at an atomic scale,tin phosphide iodide(SnIP)has garnered growing interest due to its high structural flexibility,band gap in the visible spectrum range,and non-toxicity.Herein,we report the chemical vapor transport synthesis of SnIP nanowires(NWs).The photocatalytic activity of SnIP NWs was evaluated through the degradation of two representative toxic dyes,methylene blue(MB)and malachite green(MG),under visible light irradiation(λ>400 nm).These NWs exhibited notable photocatalytic efficiency,achieving degradation rates over 97%for MB and 95%for MG within 100 min of visible light exposure.The degradation data align well with a pseudo-first-order reaction kinetics model for both dyes,with rate constants of 0.0347 and 0.0295 min^(−1).Furthermore,the synthesized catalyst demonstrated exceptional stability and recyclability,maintaining its efficient performance till six duplicate operations cycles.Scavenger testing indicated that holes and OH radicals were the main active species driving the dye’s photodegradation.The unusual photocatalytic efficiency can be attributed to their favorable band gap within the visible spectrum range and unique onedimensional structure.The results demonstrate that the SnIP NWs offer a promising choice for eco-friendly dye photodegradation.

作为第一例实验合成的具有原子级双螺旋结构的非碳无机半导体材料,SnIP以其独特的柔性和处于可见光范围的带隙吸引了越来越多的兴趣.本文采用化学气相输运法制备了SnIP纳米线并首次报道了其可见光(>400 nm)光催化降解亚甲基蓝(MB)和孔雀石绿(MG)染料的性能.SnIP纳米线在可见光驱动下,可以在100 min内降解97%的MB和95%的MG.反应动力学研究表明,降解反应近似遵循一级反应,对MB和MG的降解速率常数分别为0.0347和0.0295 min^(-1).同时,SnIP表现出优异的稳定性,6次循环后仍能保持其催化性能的重现性.不同的牺牲剂实验表明空穴和OH自由基是SnIP光催化降解MB和MG染料的活性物种.SnIP的光催化性能得益于其合适的带隙和独特的一维结构.研究结果表明,SnIP对于染料降解是一种极具潜力的环境友好的可见光催化剂.