摘要
银及银合金靶材是新型显示与半导体集成电路中重要的电子材料之一,但其制备技术在我国未能实现产业化。近年来,随着我国新型显示技术及半导体集成电路领域的快速发展,银合金靶材的市场需求总量及经济价值也在持续快速增长,相关产业化进程也在逐渐加快。为此,从银合金靶材的制备技术、专利现状、应用前景及市场概况等方面进行综合评述。针对银合金靶材制备过程中原料提纯、微合金化等关键技术的工艺原理及靶材微观组织调控方法进行分析讨论。阐述了银合金靶材制备工艺流程及微观组织形貌、晶体学取向调控的作用机制和其对合金薄膜性能的影响,提出了目前我国在银合金靶材制备领域的主要问题。此外,针对银与银合金薄膜在实际应用过程中不耐氧化、硫化和耐气候性差的特点,对国内外申请的专利进行了归纳,重点分析了微合金化过程中In、Pd、Cu、Sc、Sn等元素添加对靶材抗氧化、抗硫化、耐气候性的性能的影响及作用机理,为研发新型组分的银合金靶材提供了借鉴。最后,从市场规模及技术发展方向等方面对现阶段我国银合金靶材的研究进展进行了总结,提出了微合金化及组织优化仍是未来银合金靶材新产品开发的主要方向,指出了产业链的健全及多领域的协同联动不足是当前银合金行业发展面临的主要困难和挑战。
Silver and silver alloy target for new display and semiconductor integrated circuits is one of the most important electronic materials,but the related to the preparation technology has not yet realized the industrialization of the development in China.In recent years,with the rapid development of new display technology and semiconductor integrated circuits in our country,the total market volume and economic value of silver alloy targets are also continuing to grow rapidly,and the related industrialization process is also gradually accelerated.For this reason,a comprehensive review of silver alloy targets is conducted from the aspects of preparation technology,patent status,application prospects and market overview.The silver alloy target preparation process of raw material purification,micro-alloying and other key technologies such as process principles and target micro-structure control methods are analyzed and discussed.The process of silver alloy target preparation and micro-structure and morphology,the role of crystal orientation regulation mechanism and its effect on the performance of the alloy film are described,and the main problems in the field of silver alloy target preparation in the country are put forward at present.In addition,for the characteristics of silver and silver alloy films that are not resistant to oxidation,vulcanization and poor weather resistance in the process of practical application,we summarize and analyze them from the perspective of domestic and foreign patent applications,focusing on the analysis of the performance and mechanism of the addition of elements such as In,Pd,Cu,Sc,Sn and so on to the target anti-oxidation,anti-vulcanization and weather resistance in the process of micro-alloying to provide the reference for the research and development of the silver alloy targets of new compositions.In conclusion,the research status of silver alloy target in our country at the present stage is summarized from the aspects of market scale and technological development progress.It is put forward that the use of micro-alloying and organization optimization is still the main direction for the development of new products of silver alloy target in the future,and the soundness of the industrial chain and the lack of synergistic linkage in many fields are the main difficulties and challenges in the development of the silver alloy industry at present.
作者
高洋
廖锋尧
李强
柳春锡
葛春桥
GAO Yang;LIAO Fengyao;LI Qiang;LIU Chunxi;GE Chunqiao*(Zhongshan ZL Advanced Materials Technology Co.,Ltd.,Zhongshan 528400,China)
出处
《材料研究与应用》
CAS
2024年第5期685-694,共10页
Materials Research and Application
基金
2022年度中山市重大科技专项项目(2022A1009)。
关键词
半导体集成电路
银合金
微合金化
溅射靶材
抗氧化
抗硫化
耐气候性
专利分析
semiconductor integrated circuit
silver alloy
micro-alloying
sputtered target
anti-oxidation
anti-vulcanization
weather resistance
patent analysis