常温等离子辅助烧结3YSZ陶瓷

Plasma Assisted Sintering of 3YSZ Ceramic at Room Temperature

本研究发展了一种等离子辅助烧结(Plasma Assisted Sintering,PAS)3 mol%氧化钇稳定氧化锆(3YSZ)陶瓷的新方法。分析了等离子辅助烧结过程的电学曲线特征和电弧放电现象,并与其它电场辅助烧结技术进行了对比。探讨了等离子辅助烧结时加载的电流密度对3YSZ陶瓷的密度、晶体结构、显微结构和力学性能的影响。在80 mA/mm^(2)的电流密度下,3YSZ陶瓷经30 s的等离子辅助烧结即可获得高达98.1%的相对密度,维氏硬度达到了15.1±0.7 GPa,相比于传统烧结试样提高了~2.3 GPa。等离子体的作用还显著改变了3YSZ陶瓷的晶体结构特征,并获得了具有梯度结构的显微组织,证明了等离子辅助烧结不是单纯的等离子体加热过程,通过试样的电流也对致密化和晶体生长产生了重要影响。等离子辅助烧结技术具有起始电压低、无需预加热、烧结时间短、能源消耗低的特点,有望实现高性能陶瓷材料的低成本快速制备。

it develops a new plasma assisted sintering(PAS)method to densify 3 mol%yttria stabilized zirconia(3YSZ)ceramics.The electrical curve characteristics and arc discharge phenomenon of PAS process were studied,and compared with other electric field assisted sintering methods.The influence of current density on the density,crystal structure,microstructure,and mechanical properties of 3YSZ ceramics was investigated.At a current density of 80 mA/mm^(2),3YSZ ceramics can achieve a relative density of up to 98.1%after 30 s of PAS,with a Vickers hardness of 15.1±0.7 GPa,which is 2.3 GPa higher than that of samples prepared by conventional sintering.The effect of plasma also significantly changed the crystal structure characteristics of 3YSZ ceramics and obtained a gradient microstructure,proving that PAS is not a simple plasma heating process,and the current passing through the sample also has an important impact on the densification and grain growth.PAS has the characteristics of low initiate voltage,no need for pre-heating,short sintering time,and low energy consumption,which is expected to achieve low-cost and rapid densification of high-performance ceramic materials.