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结合增强最优缝合线与亮度优化的图像拼接

Image Stitching Combining Enhanced Optimal Seam and Optimized Brightness
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摘要 针对因大视差和曝光差异导致拼接图像产生重影与亮度不一致的问题,提出一种结合增强最优缝合线与亮度优化的图像拼接算法。首先,采用基于投影偏差最小化的形变模型配准图像,以精确对齐重叠区域;其次,设计了一种搜索重叠区域两交点之间的增强最优缝合线算法,避免拼接图像出现信息缺失;最后,在泊松融合图像的基础上构造理想拼接图像梯度与非均匀光照拟合模型的能量泛函优化拼接图像的亮度,提升拼接图像的亮度一致性。实验结果表明:在消除大视差方面,所提算法的结构相似性(SSIM)相比于文献[11]提出的算法提高了5.58%,峰值信噪比(PSNR)提高了9.55%;在消除曝光差异方面,所提算法的亮度成分平均梯度(AGIC)相比优化前降低了14.90%,平均梯度(AG)提高了12.09%,可用于大视差和曝光差异场景下的图像拼接。 An image stitching algorithm that combines enhanced optimal seam and optimized brightness is proposed to address the issue of ghosting and inconsistent brightness in panoramic images arising from large parallax and exposure differences.First,a deformation model based on minimizing projection biases was used for image registration to accurately align overlapping area.Second,an enhanced optimal seam algorithm was implemented between two intersections in the overlapping area to avoid information loss in the panoramic image.Finally,leveraging the Poisson fusion image,the energy functional of the ideal panoramic image gradient and a nonuniform illumination fitting model were constructed to optimize the brightness and improve the brightness consistency of the panoramic image.Experimental results show that compared with the algorithm proposed in reference[11],the proposed algorithm improves the structural similarity by 5.58%and peak-signal-to-noise ratio by 9.55%in terms of eliminating large parallax.Compared with before optimization,the proposed algorithm reduces the average gradient of the illumination component by 14.90%and improves the average gradient by 12.09%in terms of eliminating exposure differences.Thus,the algorithm can be used for image stitching in scenes with large disparities and exposure differences.
作者 蔚享潭 赵耀宏 向伟 Yu Xiangtan;Zhao Yaohong;Xiang Wei(Shenyang Institute of Automation,Chinese Academy of Sciences,Shenyang 110016,Liaoning,China;Key Laboratory of Opto-Electronic Information Processing,Chinese Academy of Sciences,Shenyang 110016,Liaoning,China;Institutes for Robotics and Intelligent Manufacturing,Chinese Academy of Sciences,Shenyang 110169,Liaoning,China;University of Chinese Academy of Sciences,Beijing 100049,China)
出处 《激光与光电子学进展》 CSCD 北大核心 2024年第18期364-373,共10页 Laser & Optoelectronics Progress
基金 JKW创新项目(2022 XXXX-013-12)。
关键词 图像拼接 投影偏差 增强最优缝合线 亮度优化 能量泛函 image stitching projection biases enhanced optimal seam brightness optimization energy functional
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