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双轴式不定偏心法对提高磁粒研磨轨迹均匀性的研究

Research on improving the uniformity of magnetic particle grinding trajectory by double axis indeterminate eccentricity method
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摘要 为解决TC4钛合金表面研磨不均匀、研磨轨迹重叠与加工效率低的问题,提出1种双轴式不定偏心磁粒研磨法。利用Adams软件模拟单颗磨粒的运动轨迹,采用统计方法计算运动轨迹密度的标准差值,作为平面运动轨迹均匀性的定量评价值。采用单轴式磁粒研磨法、双轴式定心磁粒研磨法和双轴式不定心磁粒研磨法在主轴转速350 r/min,研磨间隙1.5 mm的实验条件下对TC4钛合金平面研磨60 min,通过表面粗糙度、平面度大小和表面形貌来表征工件的表面均匀性。结果表明相同实验条件下采用双轴式不定偏心磁粒研磨法进行表面光整加工,粗糙度Ra由3.60μm下降到0.21μm,最大高度差由41.0μm变为6.3μm,平面度由0.0297 mm变为0.0072 mm,相比较于其它2种加工方式,双轴式不定偏心磁粒研磨既可以提高研磨效率,又可以使磨粒的运动轨迹密集程度大幅度减小,研磨轨迹更加均匀,有效去除了工件表面缺陷,显著提升表面均匀性。 A biaxial indefinite eccentric magnetic particle grinding method was proposed to solve the problems of uneven surface grinding of TC4 titanium alloy,overlapping grinding tracks and low processing efficiency.The Adams software is used to simulate the movement trajectory of a single abrasive particle,and the standard deviation of the movement trajectory density is calculated by a statistical method as a quantitative evaluation value of the uniformity of the plane movement trajectory.TC4 titanium alloy plane grinding was ground for 60 min under the experimental conditions of spindle speed of 350 r/min and grinding gap of 1.5 mm by uniaxial magnetic particle grinding method,biaxial fixed eccentric magnetic particle grinding method and biaxial indefinite eccentric magnetic particle grinding method,and the surface uniformity of the workpiece was characterized by surface roughness,flatness size and surface morphology.The results show that under the same experimental conditions,the surface photofinishing method is carried out by the biaxial indefinite eccentric method,the roughness decreases from 3.60μm to 0.21μm,the maximum height difference changes from 41.0μm to 6.3μm,and the flatness changes from 0.0297 mm to 0.0072 mm.Compared to the other methods,the biaxial indefinite eccentric method can not only improve the grinding efficiency,but also greatly reduce the density of the trajectory of the abrasive particles,the grinding trajectory is more uniform,the surface defects are effectively removed,and the surface uniformity is significantly improved.
作者 马小刚 王梓鉴 李厚乐 王泽志 Ma Xiaogang;Wang Zijian;Li Houle;Wang Zezhi(School of Mechanical Engineering and Automation,Liaoning University of Science andTechnology,Anshan 114051,China;Liaoning Provincial Key Laboratory of Special SurfaceProcessing for Complex Components,Anshan 114051,China)
出处 《电镀与精饰》 CAS 北大核心 2024年第11期67-75,共9页 Plating & Finishing
基金 国家自然科学基金(51775258) 辽宁省自然科学基金重点项目(20170540458) 精密与特种加工教育部重点实验室基金(B201703)。
关键词 磁粒研磨 平面研磨 轨迹均匀性 ADAMS 表面粗糙度 平面度 magnetic particle finishing plane grinding trajectory uniformity Adams surface rough‐ness flatness
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