Al/Ta-Nb合金阻抗匹配靶的制备工艺研究

Fabrication technology of Al/Ta-Nb alloy impedance matching target

为了获得钽铌合金(Ta-Nb)材料在高压下的状态方程数据,制备了用于激光状态方程实验研究的铝/钽铌合金(Al/Ta-Nb)阻抗匹配靶。研究了Ta-Nb合金箔的精密轧制与飞秒激光切割工艺,获得了厚度13μm,宽度400μm的Ta-Nb合金台阶样品。使用聚乙烯醇(PVA)水溶胶将Ta-Nb合金台阶与铝(Al)标准材料进行复合装配。利用白光干涉仪、电子密度计等仪器对阻抗匹配靶的表面形貌、台阶厚度、样品密度等靶参数进行精密测量,结果表明研制的Al/Ta-Nb合金阻抗匹配靶能够满足激光状态方程物理实验需求。

To obtain the equation of state(EOS)of tantalum-niobium alloy(Ta-Nb)materials under high pressure,a type of Al/Ta-Nb impedance matching target for laser EOS experiments was fabricated.The processes of precision rolling and femtosecond laser cutting of Ta-Nb alloy foil were studied.A step sample of Ta-Nb alloy with a thickness of 13μm and a width of 400μm was obtained.Ta-Nb alloy step was assembled with Al standard material using polyvinyl alcohol(PVA)hydrosol.The surface morphology,step thickness and sample density of the target were measured by white light interferometer and electronic densitometer.The results show that the Al/Ta-Nb alloy impedance matching target fabricated can meet the requirements of laser EOS experiments.