摘要
On September 10,it became publicly known that Shanghai Micro Electronics Equipment(SMEE),one of China's leading lithography machine makers,had applied in March 2023 to the National Intellectual Property Administration of China for a patent for“extreme ultraviolet(EUV)radiation generators and lithography equipment.”EUV lithography uses light with a wavelength of just 13.5 nanometers(nm)to etch silicon semiconductor wafers.The wavelength is almost the same as that of X-rays and nearly 14 times shorter than that of the widely used deep ultraviolet lithography(DUV),which uses light with a wavelength of 193 nm.
