X射线光刻机的开发研制

Research on the exploit of the X-ray photo-etching machine

X射线光刻是一种能满足大规模集成电路生产的加工技术 .本文论述了X射线光刻技术的发展历史和前景 ,阐述X射线光刻机的光源、曝光系统、掩摸和步进驱动平台等的主要结构和研制动机 。

The X ray photo etching is a main technology for the production of the large scale integrated circuit.In the paper, history and recent Development of this technology are briefly reviewed, introduced the X ray photo etching machine for the objective of research and main structure from the aspects of light source and illuminate systems and mask and stepping platform,and bring up to need attentive the primary problem in this machine design.