低强度X射线成像仪性能影响因素的研究

The Study of Low Intensity X-ray Image Scope

本文从理论分析和实验研究入手,对刚问世的低强度X射线成像仪(Lixis-lope)进行深入地探讨,给出C_sI光电阳极的x射线响应特性、制备工艺和最佳涂层条件,综合地分析和研究了影响成象仪像质的各种因素,其中包括X射线管焦斑,像增强器阴极,板屏间近帖间距及电源系统等。同时实验研制出了一台手提式低强度X射线式像仪样机。

Ths paper, which comes from analyse and experiment, probes throughly into the new Lixi- cope. It presents low X-ray respenses to the cesinm iodide photocathode and it deals with the technol- ogy of manufacturing and the best condition of film. This caticle also studies and researdes all kinds of factors which collect the quality of the image scope, including the lows of X-ray tube, the X-ray photocathode the space between MCP and screen, and the electro power, etc. Consequently, a hand, high resolution low intensity X-ray image scope was developed.