摘要
通过对场致发射显示器 (FED)发展现状及其应用前景进行系统的比较与分析 ,着重讨论了场致发射体及其阵列制备工艺以及各种关键技术的优缺点。并介绍国外著名公司的研究动态 ,展望FED的发展趋势。
The development status and application future of field emission display(FED) are compared and analysed. Field emitters, array fabrication technology and variant key technique are discussed emphatically. Study and developing of famous corporation in world is introduced, development trend of FED is showed.
出处
《真空电子技术》
2002年第5期15-17,26,共4页
Vacuum Electronics
