真空阴极电弧沉积TiB_2薄膜的组织结构及其摩擦学性能的研究

Structure and tribological properties of TiB_2 films prepared by the vacuum cathodic arc deposition

用TiB2作阴极靶,采用优化的真空阴极电弧沉积工艺制备的TiB2薄膜是由TiB2, Ti2B5,TiB和Ti组成的多相结构.薄膜的摩擦磨损试验表明:TiB2薄膜的摩擦系数为 0.139,膜层寿命超过60 min,是TiN和(Ti,A1)N 膜层的2倍.

Using TiB2 as the cathodic target, the TiB2 films prepared by the vacuum cathodic arc deposition technology are a multiphasic structure formed by TiB2, Ti2B5, TiB and Ti phases. The friction-wear tests have showed that the friction coefficient of TiB2 films is 0. 139 and their wear lifetime exceeds 60 minutes and is twice as long as TiN and (Ti,Al)N films'.