超纯石英玻璃用二氧化硅的环保型制备工艺研究

Study on Environmentally Friendly Preparation Technology of SiO_2 for ultra-pure Quartz Glass

低缺陷的超纯石英玻璃在航空航天、激光武器装备和半导体光电材料领域具有广泛的应用。然而,受到我国合成石英原料的结构缺陷和杂质缺陷制约,我国在超高纯低缺陷的石英玻璃材料制备方面与国外先进水平一直存在差距。本文使用化学气相沉积工艺,以有机硅八甲基环四硅氧烷为原料,经过精馏提纯,在氢氧火焰中水解生成二氧化硅颗粒。本工艺使用环境友好型原料有机硅,生产过程中无有毒尾气产生,且制备的二氧化硅颗粒金属杂质<1 ppm,可应用于高性能石英玻璃材料的熔融制备,满足我国国防军工行业对新型材料的迫切需求。

Ultra-high purity and low defective quartz glasses have a wide range of applications in the field of aerospace, laser weaponry and semiconductor optoelectronic materials. However, due to the structural and impurity defects of synthetic quartz raw materials, the preparation techniques in China has been lagging behind those of many other developed countries. The chemical vapor deposition process was used in this patent to produce silicon dioxide particles by hydrolysis ofoctamethylcyclotetrasiloxane, which was purified by distillation before use, in the oxyhydrogen flame. The organosilicone is environmentally friendly and no toxic gas generates during the whole process. The prepared silica particles with the metallic impurities content< 1 ppm can be utilized in the preparation of high-performance quartz glass materials, which can meet the urgent need of the new material in China’s defense military industry.