摘要
本文回顾了常规湿法清洗的局限性,在此基础上介绍了超临界CO2清洗及其优越性。论述了超临界CO2清洗在半导体行业的具体应用,并对比使用超临界CO2清洗前后的情况。
This paper Review of the limitations of conventional wet cleaning, on this basis, introduces supercritical CO2 cleaning their superiority. Discusses specific applications of supercritical CO2 cleaning in the semiconductor industry, and an example using supercritical CO2 contrast to the situation before and after cleaning.
出处
《国防制造技术》
2013年第5期34-37,共4页
Defense Manufacturing Technology
关键词
超临界CO2
清洗
半导体
Supercritical CO2
cleaning
Semiconductor
