相互作用能的非均一性对三维薄膜初期生长的影响

The influence of inhomogeneous interaction energy on the early growth of 3D thin film

考虑到基底原子位置高低不等和位置无序等现象引起的基底与吸附原子之间相互作用能的非均一性对三维薄膜初期生长二层以上原子的影响,本文建立了一个非均匀基底上的三维薄膜初期生长模型,研究了FCC(100)衬底上沉积速率、沉积能量、非均一性离散程度和分布形态等因素对三维薄膜初期生长的影响。由于基底非均匀分布的无规则性,文中将其拟合为一定范围内的随机分布。模拟结果显示:中等温度(T=450K)下相互作用能的非均一性对三维薄膜的初期生长有显著的影响;适当的增加基底不均一性离散程度和分布形态的凹凸程度对薄膜初期生长机制和岛数目都有重要影响。

Considering the phenomena that the position of basal atoms range from high and low or are unordered and its cause of the influence of inhomogeneous interaction energy between basal atoms and adsorbed atoms on the growth of the second layer atoms of 3D thin film,this paper established a early growth model of 3D thin film to study the influence of deposition rate,deposition energy,discrete degree and distribution form of inhomogeneous interaction energy on the early growth of 3D thin film on FCC( 100) substrate. Due to the inhomogeneous distribution of substrate,this paper fits it for a certain range of random distribution. The simulation results show that inhomogeneous interaction energy have a significant influence on the early growth of 3D thin film under moderate temperature( T = 450K); Reducing discrete degree and increasing concave and convex degree of distribution form for inhomogeneous interaction energy appropriately has a great influence on the early growth mechanism and island number of thin film.