衬底对微米金刚石聚晶薄膜生长及场发射特性的影响

Substrate impact of micron diamond film growth and its field emission characteristics

本文在陶瓷衬底上面利用磁控溅射的方法镀上一层厚金属钛,用不同方法对金属钛层进行表面处理,处理后的衬底放在微波等离子体化学气相沉积腔中,在相同的沉积条件下制备出不同微米金刚石薄膜。对不同的薄膜的微观表面形态、结构组成进行对比研究;对不同的薄膜用二极管型结构测试了它们的场致发射电子的性能,并对发射机理进行了深入的研究。最终分析出不同方法处理的衬底,对微米金刚石聚晶薄膜生长及场发射特性的影响的原因。

This article on ceramic substrate by using the method of magnetron sputtering plating on a thick layer of titanium,using different methods for surface treatment of metal titanium layer,processed substrate in a microwave plasma chemical vapor deposition chamber,in the same diamond film deposition was prepared under the condition of different microns. To different membrane of microscopic surface morphology,structure comparison research; To different membrane using diode structure to test the performance of their field emission electron,a thorough study on the mechanism and the launch. Final analysis of different methods for treatment of substrate,the micro polycrystalline diamond film growth,and the influence of the field emission properties.