突飞猛进的光化蚀刻工艺

Photochemical Etch-ing Process

介绍了光化蚀刻的由来和传统工艺流程中五种掩膜的制作方法及四种现代的光化蚀刻法流程及其应用范围。指出随着电子技术的不断发展,光化蚀刻这门技术已经拓展到了许多新的领域,形成了一定的生产规模,并且带动了相关企业的发展。

This paper introduces the origin of photo-chemical etching. It specifies 5 different processes for mask filmmaking in traditional production and 4 dated photochemicaletching processes and their applications. With the continuousgrowth of electronic technology, photochemical etching tech-nology has expanded into many new application fields and aproduction scale is formed. This technology gives a great im-petus to some enterprises concerned.