摘要
采用化学气相沉积法制备得到的硅/碳复合材料碳层致密均匀,电化学性能好,成为目前制备该复合材料应用较多的方法。介绍了化学气相沉积法制备的硅碳复合材料的主要复合形式及电化学性能,制备过程中不同催化剂、制备条件的选择等,综述了化学气相沉积法制备硅/碳复合材料的研究进展。对化学气相沉积法在制备硅/碳复合材料的研究方向上进行了展望、提出建议。
The preparation of the silicon / carbon composite material using chemical vapor deposition is widely applied,and carbon layer is uniform density,composite with good electrochemical performance.Main forms of silicon carbon composite material with electrochemical properties,choice of different catalysts,and preparation condition were introduced. And the research progress of chemical vapor deposition for silicon / carbon composite material was summarized. Subsequently,the future development direction of chemical vapor deposition was prospected,and put forward the proposal.
出处
《硅酸盐通报》
CAS
CSCD
北大核心
2015年第S1期7-11,共5页
Bulletin of the Chinese Ceramic Society
基金
吉林省科技厅产业技术创新战略联盟项目(20130305017GX)
吉林省教育厅吉教科合字([2014]第103号)
关键词
化学气相沉积
硅/碳复合材料
催化剂
电化学性能
chemical vapor deposition(CVD)
Si / C composite material
catalyst
electrochemical performance
