期刊文献+

300mm直拉单晶硅生长过程中晶体长度对内应力的影响 被引量:1

Influence of Crystal Length on the Thermal Stress in 300 mm CZ Single Crystal Silicon Growth
下载PDF
导出
摘要 晶体内热应力是影响太阳能级单晶硅性能的关键因素之一。本文通过对晶体生长过程中热量的散失方式与晶体内应力之间的关系进行研究。结果表明,在晶体生长初期,晶体内热量主要通过籽晶传热、晶体肩部表面散热和晶体侧表面散失来进行交换。因此,在晶体籽晶下方、肩部下方和晶体侧表面均出现较大应力区域;随晶体生长的进行,热量传输方式转变为以晶体侧表面散热为主,这也导致晶体内最大应力值均集中在该区域。同时,晶体内最大应力值随晶体长度的增加而逐渐降低。 The thermal stress is one of the key factors to affect the quality of solar-grade single crystal silicon. In this paper,the relationship between heat loss behavior and thermal stress in crystal during crystal growth has been analyzed. The results show that the heat exchange in the crystal mainly be conducted by heat conduction by seed,heat loss from shoulder surface and heat loss from crystal peripheral surface in the starting crystal growth. Consequently,the high thermal stress intensity has been located below the seed, shoulder surface and peripheral surface. As crystal growing, the heat transmission way has been changed to heat loss from crystal surface near crystal-liquid interface,resulting to the maximum thermal stress appear in this part. Additionally,the maximum thermal stress decrease with increasing crystal length.
出处 《硅酸盐通报》 CAS CSCD 北大核心 2015年第S1期159-162,共4页 Bulletin of the Chinese Ceramic Society
基金 宁夏自然科学基金(NZ13041) 2012宁夏自治区科技支撑项目 国家自然基金项目(61366006)
关键词 单晶硅 热传递 热辐射 热应力 single crystal silicon heat transmission thermal radiation thermal stress
  • 相关文献

参考文献4

二级参考文献34

  • 1闵乃本.晶体生长物理基础[M].上海:上海科技出版社,1982.
  • 2HMingLiaw 张重敏.直拉单晶硅中的氧和碳.中国有色冶金,1983,:37-45.
  • 3钱壬章,传热分析与计算,1987年
  • 4佘思明.半导体材料学[M].长沙:中南工业大学出版社,1992,106-199.
  • 5Kalaev V V, Evstratov I Y, Makarov Yu N, et al. Gas Flow Effect on Global Heat Transport and Melt Convection in Czochralski Silicon Growth [ J ]. Journal of Crystal Growth ,2003,2.49:87-99.
  • 6Teng Y Y, Chen J, Huang C C, et al. Numerical Investigation of the Effect of Heat Shield Shape on the Oxygen Impurity Distribution at the Crystal-melt Interface During the Process of Czochralski Silicon Crystal Growth [ J ]. Journal of Crystal Growth, 2012,352 : 167-172.
  • 7Norihisa M, Keigo H, Yasuo S, et al. The Effects of Argon Gas Flow Rate and Furnace Pressure on Oxygen Concentration in Czochralski Silicon Single Crystals Grown in a Transverse Maoletic Field [ J]. Journal of Costal Growth ,2000,210(4 ) :532-540.
  • 8Zhang Z C, Ren B Y, Chen Y G, et al. Effects and Numerical Analysis of Argon Gas Flow on the Oxygen Concentration in Czochralski Silicon Single Crystal Growth [ J ]. Microelectronic Engineering, 2003,66 : 504 -509.
  • 9Norihisa M, Youji Si, Keisei A, et al. The Effects of Argon Gas Flow Rate and Furnace Pressure on Oxygen Concentration in Czochralski-grown Silicon Crystals[ J]. Journal of Crystal Growth, 1998,186:362-368.
  • 10Omidreza A N, M 'Hamdi M, Jomaa M. Effect of Crystal and Crucible Rotations on the Interface Shape of Czochralski Grown Silicon Single Crystals [ J ]. Journal of Crystal Growth ,2001,318 : 173-177.

共引文献26

同被引文献7

引证文献1

相关作者

内容加载中请稍等...

相关机构

内容加载中请稍等...

相关主题

内容加载中请稍等...

浏览历史

内容加载中请稍等...
;
使用帮助 返回顶部