浓HNO_3修饰基板液相沉积制备SrTiO_3薄膜

Substrate Modification by Concentrated HNO_3 and Preparation of SrTiO_3 Thin Film by Liquid Phase Deposition

采用液相沉积技术,以氟钛酸铵、硼酸和硝酸锶为原料,在前驱液pH=3.5、沉积温度60℃,沉积时间6 h条件下成功制备了SrTiO_3薄膜。采用接触角测试仪对浓HNO_3修饰的玻璃基板进行亲水性测定采用X射线衍射仪技术和扫描电镜表征薄膜相组成和微观形貌。研究结果表明:浓HNO_3修饰30 min,后玻璃基板接触角下降到10.404°,沉积制备的SrTiO_3薄膜结晶良好且纯度较高在基板表面以纤维簇状模式生长。文章同时探讨了SrTiO_3薄膜生长机理。

SrTiO_3 thin film was successfully prepared by liquid phase deposition method using(NH_4)_2TiF_6,H_3BO_3 and Sr(NO_3)_2 as raw materials under specific factors(pH = 3.5,60 ℃,6 h).Surface hydrophilicity of glass substrate was measured by contact angle meter.Phase composition and microscopic morphology of SrTiO_3 thin film were characterized by XRD and SEM.The results show that contact angle value of substrate surface decreased to 10.404° with 30 min modification by concentrated HNO_3.The pure SrTiO_3 thin film is well crystallined with fiber cluster morphology.Growth mechanism of SrTiO_3 thin film was also discussed.