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激光照明下黑硅表面的散射偏振特性研究

Study on Scattering Polarization Properties of the Black Silicon Surface under the Laser Irradiation
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摘要 为了研究人工微结构材料表面的偏振特性,利用波长为532nm的激光器、精密旋转台和弱光照度计,自行搭建表面散射特性的测量系统。以黑硅为被测样品,测量样品不同姿态时对散射光偏振特性的影响,并对比分析随入射光入射角、样品方位角及俯仰角对散射光偏振分布的影响。实验结果表明,散射光的偏振度与表面微结构的周期性,以及入射角度有关。本文的研究对散射光的偏振特征应用在探测的分析领域上提供一定的实验基础。 In order to study the polarization properties of artificial microstructure materials surfaces under the laser irradiation,an experiment device is designed to measure the semispherical scattering properties of artificial microstructure materials surfaces.The measuring system consists of a laser device of 532 nm wavelength,precision rotating platforms,and a low-light level luxmeter.Black silicon as the tested sample,the influence on polarization properties of scattered light was measured with different attitude.The effects of incident angle of incident light,sample azimuthal angle and pitch angle on the polarization properties of scattered light of such a kind were comparatively analyzed.Experimental results showed that the degree of polarization of the scattered light was related to periodic surface microstructure and the angle of incidence.This study provided some experimental basis for the applications of polarization properties of scattered light in the analysis field of detection.
出处 《光谱学与光谱分析》 SCIE EI CAS CSCD 北大核心 2016年第S1期403-404,共2页 Spectroscopy and Spectral Analysis
关键词 散射 人工微结构材料 Scattering Polarization Artificial microstructure material
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