期刊文献+

电子陷阱对卤化银微晶感光过程的影响 被引量:4

Effects of Electron Trap on Photosensitive Process of AgX Microcrystals
下载PDF
导出
摘要 根据成核 -生长模型详细阐述了卤化银微晶中电子陷阱与空穴陷阱的概念以及电子陷阱在感光过程中的作用 ,着重于介绍如何优化电子陷阱密度和深度来降低复合以及成核点数目 ,从而达到提高潜影形成效率的目的 . Based on the Nucleation and Growth model, this paper presents the conceptions of the electron trap and the hole trap in silver halide microcrystals and the effects of the electron trap on photosensitive process in detail, especially introduces how to optimize the density and depth of electron traps to decrease recombination and the number of nucleation sites so as to increase latent imaging formation efficiency.
出处 《河北大学学报(自然科学版)》 CAS 2002年第4期396-399,414,共5页 Journal of Hebei University(Natural Science Edition)
基金 教育部科技研究重点项目 (0 10 11) 河北省自然科学基金资助项目 (19910 4 )
关键词 感光过程 电子陷阱 卤化银微晶 束缚电子 空穴陷阱 感化材料 潜影形成效率 electron trap silver halide microcrystals trapped electron
  • 相关文献

参考文献2

二级参考文献34

  • 1Mitchell J W. Role of Dislocation in Silver Halide Photography. J.Imaging Sci. & Tech. , 1997, 41 (1): 1
  • 2Beutel J. Photoconductivity of Microcrystalline Cubic Silver Bromide Emulsion. J. Photogr. Sci. Eng., 1975, 19 (2):95
  • 3Vekenan G, Maenhout - Van Der Vorst W. Transient Photoconduc tivity in AgBr Emulsion Grains, Part I: Influence of the Ambient Me dium. J. Inf. Rec. Mater. 1991, 19(3): 159
  • 4Ehrlich S H, Leubner L H. Iridium oncentration Dependence of Mi crowave Photoconductivity and Photographic Properties in Silver Ha lide Emulsions. J. Imaging Sci. & Tech. , 1992, 36(2): 105
  • 5Vanden Eeden M, Callens F, De Roose A, ectal. Computer Simula tion of Transient Microwave Photoconductivity in Silver Halide Mi crocrystals. J. Imaging Sci. & Tech. , 1994, 38(5):475
  • 6Tadaaki Tani. Characterization of Sensitization Centers and Fog Cen ters Formed during Digestion for Sulfur Sensitization. J. Imaging Sci.& Tech. , 1995, 39(5): 386
  • 7Takaji Kaneda. A New Approach to Estimation of Depth of Electron Traps in AgBr Emulsion Grains on the Basis of the Gurney - Mott Model. J. Imaging sci. , 1989, 33 (4): 116
  • 8Hailstone R K. Computer Simulation Studies of Silver Cluster Forma tion on AgBr Microcrystals. J. Phys. Chem., 1995, 99 (13):4416
  • 9Müssig Th. Principles of Microwave Absorption Technique Applied to AgX Microcrystals. J. Imaging. Sci. & Tech. , 1997, 41 (2): 122
  • 10Hamilton J F. A Modified Proposal for the Mechanism of Sulfur Sensitization in Terms of Capture Cross. J. Photogr. Sci. Eng. ,1983, 27 (6): 227

共引文献14

同被引文献23

  • 1傅广生,刘荣鹃,杨少鹏,江晓利,代秀红,李晓苇.曝光强度对卤化银微晶中载流子行为及其陷阱效应的影响[J].感光科学与光化学,2005,23(1):21-28. 被引量:3
  • 2张荣香,李晓苇,张继县,赖伟东,张伟.感绿染料增感AgCl乳剂的光电子特性——增感时间对光电子衰减的影响[J].河北大学学报(自然科学版),2005,25(6):591-594. 被引量:1
  • 3李晓苇,李莉,张荣香,张继县,江晓利,杨少鹏.染料吸附对氯化银微晶表面结构的影响[J].人工晶体学报,2006,35(4):826-829. 被引量:3
  • 4Bryant R A,Olm M T, Fenton D E. Photographic emulsions of enhanced sensitivity[P]. USP 5 728 517,1998 - 03 - 17.
  • 5Mydlarz Z G,Budz J A,Bell D L. Digital imaging with high-chloride silver halide emulsions[P]. USP 5 783 373,1998- 07- 21.
  • 6LI Xiao-wei,GENG Ai-cong,YANG Shao-peng,et al. Characteristics of Shallow Electron Traps in Cubic AgCI Microcrystals Doped with K4Fe(CN)6 [J]. Chin. Phys. Lett., 2003, 20(8):1323 - 1325.
  • 7YANG Shao-peng, LI Xiao-wei, HAN Li, et al. Characteristics of photoelectron decay of silver halide microcrystal illuminated by a short pulse laser[J]. Chin. Phys. Lett. ,2002,19(3) :429 - 431.
  • 8Mussig T. Principles of microwave absorption technique applied to AgX microcrystals [ J ] J. Imaging Sci. Tech., 1997,41 ( 2 ): 118 -126.
  • 9米斯C E K,詹姆斯T H.照相过程理论[M].北京:科学出版社,1979.249-320.Mees C E K,James T H.The Theory of the Photographic Process[M].Beijing:Science Press,1979.249-320.
  • 10Sajio Hiroshi,Shiojiri Makoto.Island Formation and Layer Growth of Photosensitizing Dye J-Aggregates on AgBr Microcrystals Growth in Gelatin[J].Imaging Science and Technology,1997,41(3):266.

引证文献4

二级引证文献3

相关作者

内容加载中请稍等...

相关机构

内容加载中请稍等...

相关主题

内容加载中请稍等...

浏览历史

内容加载中请稍等...
;
使用帮助 返回顶部