基于原子层沉积技术的石英管表面减反射膜的制备

Preparation of Anti-Reflection Coatings on Quartz Tube Surfaces Based on Atomic Layer Deposition

采用原子层沉积(ALD)技术在石英管表面制备了薄膜,研究了该薄膜的均匀性,以及石英管的内径、外径、长度对沉积薄膜均匀性的影响。以单波长减反射膜为研究对象,实验测试的反射光谱与仿真结果一致,石英管表面最低反射率可降至0.17%。忽略夹具影响,石英管外壁与内壁的减反射薄膜的非均匀性基本一致,在±1.69%范围内,内外壁表面减反射薄膜的厚度和中心波长相同,且石英管尺寸对内外壁薄膜均匀性无明显影响。利用ALD技术可在大曲率元件的内外表面沉积厚度偏差小且均匀性分布相似的减反射薄膜。

The uniformity distributions of the anti-reflection(AR)coatings prepared on the quartz tube surfaces by the atomic layer deposition(ALD)technique as well as the influences of the inner diameter,outer diameter,and quartz tube length on the uniformity distributions of the deposited coatings are studied.With the single-wavelength AR coatings as the research object,the reflectivity spectrum from the experimental test matches well with the simulated result.The minimum reflectivity on the quartz tube surface is decreased to 0.17%.If the effect of the sample holder is ignored,the non-uniformity of the AR coatings for the outer and the inner surfaces of the quartz tubes is roughly identical,which is within the range of±1.69%.The thicknesses and the central wavelengths of the AR coatings for the inner and outer surfaces are almost identical.Moreover,the variation of the quartz tube size has no obvious effect on the coating uniformity of the outer and inner surfaces.Therefore,the AR coatings with small thickness deviations and similar uniformity distributions can be deposited on the outer and inner surfaces of large curvature elements by the ALD technology.