基于超精密激光直写系统制作二维光栅

Two-Dimensional Grating Fabrication Based on Ultra-Precision Laser Direct Writing System

二维光栅是光刻机光栅尺系统的核心元件。搭建了超精密激光直写系统,基于二维超精密工件台,通过旋转基片90°进行两次曝光,制作出栅线密度为1200 line/mm的二维光栅掩模。原子力显微镜和扫描电镜结果表明,所制作的掩模轮廓清晰,空间分布均匀。实验结果证明了超精密激光直写系统能够制作出二维光栅掩模,在制作大尺寸、高精度二维计量光栅方面有着广阔的应用前景。

Two-dimensional(2 D)gratings are the key elements of optical encoders in lithography machines.Herein,an ultra-precision laser direct writing system is proposed.Based on the ultra-precision platform,we obtain a 2 D grating mask with grid line density of 1200 line/mm after double exposure by rotating the substrate by 90°.The atomic force microscopy and scanning electron microscopy images indicate that the profile of the 2 D grating mask is clear and its spatial uniformity is excellent.These results demonstrate that the proposed ultra-precision laser direct writing system effectively fabricates a 2 D grating mask,showing promise in the fabrication of large,high-precision 2 D metrological gratings.