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MOD法制备SrBi_2Ta_2O_9铁电薄膜及其性能研究 被引量:1

Properties of SrBi_2Ta_2O_9 Thin Films Prepared by Metalorganic Decomposition
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摘要 在Pt/TiO_2/SiO_2/Si衬底上,用金属有机物分解法(MOD)制备了SrBi_2Ta_2O_9(SBT)铁电薄膜.研究了SBT薄膜的晶体结构,表面形貌以及它的电学性能,结果表明SrBi_2Ta_2O_9铁电薄膜具有良好的抗疲劳特性,在经过10~9次极化反转后其剩余极化强度P_r变化不大,约为3%,并且漏电流较低,在测量电压为1V时,漏电流密度为5.73×10^-8A/cm^2. SrBi2Ta2O9(SBT) ferroelectric thin films were prepared on Pt/TiO2/SiO2/Si substrates by using a metalorganic decomposition(MOD) method. The structure, surface morphology and electrical properties of SBT thin films were studied. SBT thin films showed excellent free-fatigue properties affter 109 switching cycles. The laskage current density was 5.73 × 10~8A/cm2 at 1V.
出处 《哈尔滨理工大学学报》 CAS 2002年第6期34-36,共3页 Journal of Harbin University of Science and Technology
基金 国家自然科学基金资助(19890310)
关键词 MOD法 制备 铁电薄膜 SrBi2Ta2O9薄膜 有机金属分解法 SrBi_2Ta_2O_9 thin films ferroelectric metalorganic decomposition
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  • 1[1]SCOTT J F, PAZ De Araujo C A. Ferroelectric Memories[J]. Science, 1989, 246: 1400-1404.
  • 2[2]PAZ De Araujo C A, CUCHIARO J D. Fatigucfree Ferroelectric Capacitors with Platinum Electrodes[J]. Nature(London),1995, 374: 627-629.
  • 3[3]AUCIELLO O, SCOTT J F. The Physics of Ferroelectric Memories[J]. Phsics Today, 1998, 85: 22-27.
  • 4[4]BAHNG J H, LEE M. Spectrospcopic Ellipsometry Study of SrBi2Ta2O9 Ferroelectric Thin Films[J]. Appl. Phys. Lett., 2001,79:1664-1666.
  • 5[5]BOYLE T J, BUCHHEIT C D. Formation of SrBi2Ta2O9: Part Synthesis and Characterization of A Novel "Sol-Gel" Solution for Production of Ferroelectric[J]. J. Mater. Res., 1996, 11: 2274-2281.
  • 6[6]TAKEMURA K, NOGUCHI. Dielectric Anomaly in Strontium Bismuth Tantalate Thin Films[J]. Appl. Phys. Lett., 1998,73: 1649- 1651.
  • 7[7]WU D, LI A D. Characterization of Metalorganic Decomposition-derived SrBi2Ta2O9 Thin Films with Defferent Thicknesses[J]. Appl. Phys., 2000, 87: 1795-1800.
  • 8[8]JOSHI P C, RYU S O. Properties of SrBi2Ta2O9 Ferroelectric Thin Films Prepared by A Modified Metalorgnic Solution Deposition Technique[J]. Appl. Phys. Lett., 1997, 70: 1080-1082,
  • 9[9]AL-SHAREEF H N, DIMOS D. Qualitative Model for the Fatigue-free Behavior of SrBi2Ta2O9[J]. Appl. Phys. Lett.,1996, 68: 690- 692.

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