电化学沉积技术制备白钨矿结构钼酸盐薄膜

Study of Preparation Molybdate Films with Structure of Scheelite-type by Electrochemical Deposition Technology

采用恒电流技术于室温条件下直接在金属钼片上制备了白钨矿结构的钼酸盐,包括SrMoO_4,BaMoO_4和Ba_1-xSr_xMoO4(0≤x≤1)等薄膜,控制电化学反应的工艺条件为:电流密度为1mA/cm^2;电解液的pH值为13;电化学处理时间为1h.SEM,XRD和XPS分析结果表明,制备的钼酸盐薄膜均为表面均匀致密的四方晶系单相薄膜.

Highly crystallized molybdate films (including SrMoO4, BaMoO4, Ba1-xSrxMoO4) were prepared on molybdenum substrate by electrochemical deposition method using constant direct current at room temperature. The current density was 1mA/cm2, the pH value was 13, and the time of electrochemical reaction was an hour. The results of SEM, XRD and XPS measurements of those films show that all films have single tetragonal structure of scheelite - type.