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立体成型中紫外光能量场的分布研究 被引量:2

RESEARCH ON FIELD DISTRIBUTION OF THE ULTRAVIOLET ENERGY IN STEREOLITHOGRAPHY
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摘要 基于光的波动理论 ,对紫外光立体成型技术中的聚焦光能量场进行了深入的理论分析 ,阐明了点光源所辐射的连续球面波在凹椭球面上的反射聚焦理论及反射光波场轴向和侧向的能量分布形式近似于高斯分布 ;同时从实验分析角度研究得出 ,经光纤耦合传输及透镜聚焦至树脂液面的光能量也基本上呈高斯分布 ;研究为立体成型技术中有效地利用紫外点光源的辐射能和提高成型精度 ,提供了充分的理论依据 。 Based on the optical wave′s theory,the focusing energy field of the UV light in the stereolithography have been analyzed in depth.The reflect focusing theory that spherical continuous wave radiated by point light source is reflected from concave ellipsoidal surface have been enucleated and the axial and lateral optical energy distribution of the reflecting optical wave field have been showed up.The analysis indicates that distribution of the intensity in optical axis is approximately Gauss distribution.And by means of experimentation,the research educes that the optical energy being coupled by optical fiber and being focused by len is approximately Gauss distribution,too.For utilizing the UV radiant energy and improving the prototyping precision in the stereolithography effectively,the research supplies sufficient academic basis and has important guidance on the optical design of stereolithography.
出处 《光子学报》 EI CAS CSCD 北大核心 2002年第12期1542-1545,共4页 Acta Photonica Sinica
基金 西安理工大学博士启动基金 西安理工大学青年基金资助项目
关键词 紫外光能量场 紫外辐射 立体成型 能量分布 光纤 快速成型技术 光学系统 UV radiation Stereolithography Energy distribution Optical fiber
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参考文献4

  • 1Cheng W,Fuh J H,Nee A C,et al.Multi-objective optimization of part-building orientation in stereolithography.Rapid Prototyping Journal,1995,1(4):12~23
  • 2Lan P T,Chon S Y,Chen L L et al.Dertermining fabrication orientations for rapid proto-typing with stereolithography apparatus.Computer-Aided Design,1997,29(1):53~62
  • 3Wodziak J R,Geoge M,Kirschman C.A genetic algorithm for optimizing multiple part placement to reduce bulid time.The Fifth International Conference on Rapid Prototyping,ohio:Dayton,1994:201~210
  • 4于殿泓,吴懋亮,郭俊杰,卢秉恒.紫外光快速成型中辐射能的汇聚分析[J].西安交通大学学报,2001,35(11):1159-1162. 被引量:2

二级参考文献4

  • 1Lan P T,Computer Aided Design,1997年,29卷,1期,53页
  • 2蒋秀明,高等光学,1996年,119页
  • 3Cheng W,Rapid Prototyping J,1995年,1卷,4期,12页
  • 4刘瑞祥(译),波动光学,1983年,289页

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同被引文献11

  • 1王晓阳,徐艳梅,张春平,李静,莫越奇,吴宏滨,曹镛,Yu Gang.MEH-PPV薄膜的光学参数计算[J].光子学报,2005,34(5):746-749. 被引量:10
  • 2张小康,廖常俊,冯洲明,吴扬哲,蔡继业,叶晓靖,刘颂豪.耐热硅树脂材料的光学特性研究[J].光子学报,2006,35(2):205-208. 被引量:3
  • 3王德海,江棂.紫外光固化涂层--理论与应用[M].北京:科学出版社,2001.
  • 4CHOU S Y,KRAUSS P R,RENSTROM P J. Imprint of sub25 nm vias and trenches in Polymers[J]. Appl Phys Lett, 1995,67(21):3114-3116.
  • 5XIA Y, WHITESIDES G M. Soft lithography[J]. Annu Rev Mater Sci ,1998,28(1) :153-184.
  • 6CHOU S Y, KRAUSS P R. Imprint lithography with sub-10 nm feature size and high throughput[J]. Microelectron Engic, 1997,35(1) :237-240.
  • 7CHOU S Y, KRAUSS P R. Imprint lithography with 25nanometer resolution[J]. Science,1996,272(5258) :85-87.
  • 8ITANI T, TOSHIFUMI S, WATARU W. Total solution in 157 nm lithography for below 65 nm node semiconductor devices[J ]. Microelectron Eng, 2004, 73-74 (6) : 11 - 15.
  • 9WANG Xiao-yang, XU Yan-mei, ZHANG Chun-ping, et al. Caleulation of optieal parameter of MEH-PPV film[J]. Acta Photonica Sinica, 2002,31 (12): 1542-1545.
  • 10吴懋亮,赵万华,于殿泓,李涤尘,卢秉恒.光固化成型中紫外光源-光纤耦合研究[J].光子学报,2001,30(11):1366-1371. 被引量:7

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